Clean Oven System

Clean Oven System

This clean oven system employs a unique special heat-resistant filter (newly developed)!

Product Overview This clean oven system employs a unique special heat-resistant filter (newly developed)!
Suitable for mass production, space-saving, and contributes to productivity!
No HEPA filter is used to achieve a cleanliness (Class 10) equivalent to that of IR ovens.
Heating and temperature rise capacity and temperature uniformity are also greatly improved compared to conventional hot air ovens.
The hot-air circulation type requires only half the amount of N₂ and electricity compared to IR ovens, demonstrating excellent energy-saving performance. In addition, since the entire furnace body is heated, there is no condensation or sublimation on the furnace walls and no reduction in operating rate due to periodic cleaning.
Use Cure of PI (Flexible OLED, etc.), TFT annealing/activation, dehydrogenation, etc., Frit seal (OLED), glass sintering, etc.
Equipment Specifications
Substrate dimensions G2.5 to G8.5
Heating method Convection type (hot air circulation method)
Max. temperature Max.550°C
Temperature Accuracy ΔT= ≦9°C
Temperature rise/fall rate Up rate = 7°C/min Down rate = -7°C/min (Ave.)
clean level Class 10
atmosphere (e.g. musical) Air or N₂ gas (Pure N₂)
O₂ concentration in furnace ≦10ppm (when Pure N₂ is used)

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